Gerd Pohlers
at DuPont Electronics & Industrial
SPIE Involvement:
Publications (14)

Proceedings Article | 25 March 2016 Paper
Cong Liu, Kevin Rowell, Lori Joesten, Paul Baranowski, Irvinder Kaur, Wanyi Huang, JoAnne Leonard, Hae-Mi Jeong, Kwang-Hwyi Im, Tom Estelle, Charlotte Cutler, Gerd Pohlers, Wenyan Yin, Patricia Fallon, Mingqi Li, Hyun Jeon, Cheng Bai Xu, Pete Trefonas
Proceedings Volume 9779, 97791Y (2016)
KEYWORDS: 193nm lithography, Lithography, Optical lithography, Double patterning technology, Line width roughness, Critical dimension metrology, Printing, Materials processing, Photoresist materials, Photoresist developing, Semiconducting wafers, Cadmium, Scanning electron microscopy

Proceedings Article | 26 March 2008 Paper
Proceedings Volume 6923, 69231D (2008)
KEYWORDS: Ions, Boron, Atomic force microscopy, Semiconducting wafers, Scanning electron microscopy, Fourier transforms, Silicon, Critical dimension metrology, Lithography, Monte Carlo methods

Proceedings Article | 14 May 2004 Paper
Gerd Pohlers, George Barclay, Azher Razvi, Carolyne Stafford, Anthony Barbieri, James Cameron
Proceedings Volume 5376, (2004)
KEYWORDS: Systems modeling, Polymers, Carbonates, Photoresist materials, Absorbance, Molecules, Data modeling, Chemistry, Matrices, Medium wave

Proceedings Article | 12 June 2003 Paper
George Barclay, Subbareddy Kanagasabapathy, Gerd Pohlers, Joseph Mattia, Kao Xiong, Sheri Ablaza, James Cameron, Tony Zampini, Tao Zhang, Shintaro Yamada, Francois Huby, Kenneth Wiley
Proceedings Volume 5039, (2003)
KEYWORDS: Silicon, Polymers, Etching, Lithography, Photoresist materials, Imaging systems, Resistance, Chromatography, Calibration, Photoresist developing

Proceedings Article | 12 June 2003 Paper
Tracy Lindsay, Robert Kavanagh, Gerd Pohlers, Takafumi Kanno, Young Bae, George Barclay, Subbareddy Kanagasabapathy, Joseph Mattia
Proceedings Volume 5039, (2003)
KEYWORDS: Photoresist materials, Polymers, Lithography, Photomasks, 193nm lithography, Phase shifts, Etching, Photoresist developing, Resistance, Silicon

Showing 5 of 14 publications
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