Gerd Pohlers
at Dow Electronic Materials
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 25 March 2016 Paper
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Lithography, Optical lithography, Cadmium, Materials processing, Scanning electron microscopy, Printing, Photoresist materials, Line width roughness, Double patterning technology, Critical dimension metrology, Semiconducting wafers, Photoresist developing, 193nm lithography

Proceedings Article | 26 March 2008 Paper
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Ions, Silicon, Fourier transforms, Atomic force microscopy, Scanning electron microscopy, Monte Carlo methods, Boron, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 14 May 2004 Paper
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Data modeling, Polymers, Matrices, Molecules, Chemistry, Carbonates, Photoresist materials, Absorbance, Medium wave, Systems modeling

Proceedings Article | 12 June 2003 Paper
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Lithography, Imaging systems, Calibration, Etching, Polymers, Silicon, Resistance, Photoresist materials, Chromatography, Photoresist developing

Proceedings Article | 12 June 2003 Paper
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Lithography, Etching, Polymers, Silicon, Resistance, Photoresist materials, Photomasks, Photoresist developing, 193nm lithography, Phase shifts

Showing 5 of 14 publications
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