Gerhard Gross
Chief Executive Officer at IMS Nanofabrication GmbH
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 17 October 2008 Paper
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Nanotechnology, Electrodes, Particles, Ions, Silicon, Hydrogen, Ion beams, Photomasks, Line edge roughness, Resolution enhancement technologies

Proceedings Article | 28 March 2008 Paper
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Manufacturing, Photomasks, Computed tomography, Maskless lithography, Semiconducting wafers, Nanofabrication, Prototyping

Proceedings Article | 20 March 2008 Paper
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Wafer-level optics, Lithography, Electron beam lithography, Electron beams, Polymethylmethacrylate, Electrodes, Silicon, Maskless lithography, Semiconducting wafers, Nanofabrication

Proceedings Article | 30 October 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Electron beam lithography, Optical lithography, Argon, Sputter deposition, Particles, Ions, Gallium arsenide, Silicon, Chromium, Ion beams

SPIE Journal Paper | 1 January 2003
JM3 Vol. 2 Issue 01
KEYWORDS: Ions, Ion beams, Photomasks, Particle beams, Photodynamic therapy, Maskless lithography, Magnetism, Lithography, Semiconducting wafers, Charged particle optics

Showing 5 of 6 publications
Conference Committee Involvement (2)
Photomask Technology
9 September 2003 | Monterey, California, United States
Photomask Technology
1 October 2002 | Monterey, CA, United States
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