Dr. Gerhard W. B. Schlüter
Product Manager at KLA MIE GmbH
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 16 June 2005 Paper
Proc. SPIE. 5835, 21st European Mask and Lithography Conference
KEYWORDS: Lithography, Reticles, Metrology, Contamination, Microsystems, Image registration, Optical testing, Scanning electron microscopy, Photomasks, Critical dimension metrology

Proceedings Article | 16 June 2005 Paper
Proc. SPIE. 5835, 21st European Mask and Lithography Conference
KEYWORDS: Deep ultraviolet, Opacity, Calibration, Ultraviolet radiation, Microscopy, Chromium, Scanning electron microscopy, Photomasks, Critical dimension metrology, Standards development

Proceedings Article | 6 December 2004 Paper
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Electron beams, Reticles, Metrology, Contamination, Microsystems, Opacity, Manufacturing, Scanning electron microscopy, Photomasks, Critical dimension metrology

Proceedings Article | 16 August 2002 Paper
Proc. SPIE. 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Lithography, Reticles, Edge detection, Metrology, Microsystems, Interferometers, Image registration, Optical resolution, Photomasks, Critical dimension metrology

Proceedings Article | 1 August 2002 Paper
Proc. SPIE. 4754, Photomask and Next-Generation Lithography Mask Technology IX
KEYWORDS: Lithography, Mirrors, Metrology, Image registration, Optical testing, Objectives, Photomasks, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

Showing 5 of 11 publications
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