Dr. Germain L. Fenger
Product Manager at Mentor, a Siemens Business
SPIE Involvement:
Author
Area of Expertise:
Computational Lithography , OPC , DSA , EUVL
Websites:
Publications (37)

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Logic, Optical lithography, Metals, Scanners, Manufacturing, Bridges, Photomasks, Extreme ultraviolet lithography, Optical proximity correction, Overlay metrology

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Image quality, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, SRAF, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Scanners, Error analysis, Manufacturing, Wavefronts, 3D modeling, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Tolerancing

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Wafer-level optics, Finite-difference time-domain method, Scanners, Projection systems, Photomasks, Extreme ultraviolet lithography, Optical proximity correction, Semiconducting wafers, Electromagnetism, Systems modeling

SPIE Journal Paper | August 19, 2017
JM3 Vol. 16 Issue 04
KEYWORDS: Photomasks, Semiconducting wafers, Optical proximity correction, Wafer-level optics, Finite-difference time-domain method, Extreme ultraviolet, Systems modeling, Scanners, Extreme ultraviolet lithography, Projection systems

SPIE Journal Paper | July 25, 2017
JM3 Vol. 16 Issue 03

Showing 5 of 37 publications
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