Dr. Germain L. Fenger
Director Product Management at Siemens EDA
SPIE Involvement:
Area of Expertise:
Computational Lithography , OPC , DSA , EUVL
Publications (75)

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12954, 129540L (2024) https://doi.org/10.1117/12.3010127
KEYWORDS: SRAF, Printing, Semiconducting wafers, Optical proximity correction, Photoresist processing, Extreme ultraviolet lithography, Calibration, Extreme ultraviolet

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12953, 129530K (2024) https://doi.org/10.1117/12.3010519
KEYWORDS: Optical proximity correction, Semiconducting wafers, Extreme ultraviolet lithography, Modeling, Scanners, Reticles

Proceedings Article | 10 April 2024 Poster + Paper
Proceedings Volume 12953, 1295319 (2024) https://doi.org/10.1117/12.3010912
KEYWORDS: Failure analysis, Stochastic processes, Monte Carlo methods, Optical proximity correction, Extreme ultraviolet lithography, Image processing, Photovoltaics, Photon transport, Light absorption, Industry

Proceedings Article | 10 April 2024 Presentation
Shibing Wang, Yixiao Zhang, Jiechang Hou, Yuansheng Ma, Daman Khaira, Germain Fenger, Yuyang Sun, Bassem Hamieh, Boaz Alperson, Durairaj Baskaran, Md Rahman, Jerome Wandell, Youngjun Her
Proceedings Volume 12954, 129540W (2024) https://doi.org/10.1117/12.3010510
KEYWORDS: Directed self assembly, Stochastic processes, Optical lithography, Line edge roughness, Extreme ultraviolet, Atomic layer deposition, Semiconductors, Product engineering, Polymers, Personal protective equipment

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12955, 1295516 (2024) https://doi.org/10.1117/12.3010898
KEYWORDS: Optical proximity correction, Metrology, Modeling, Extreme ultraviolet, Scanning electron microscopy, Shrinkage, Contour extraction, Signal to noise ratio, EUV optics

Showing 5 of 75 publications
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