Dr. Germain L. Fenger
Product Manager at Mentor, a Siemens Business
SPIE Involvement:
Author
Area of Expertise:
Computational Lithography , OPC , DSA , EUVL
Publications (47)

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Diffraction, Refractive index, Polarization, Nickel, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Tantalum, Ruthenium

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Statistical analysis, Data modeling, Calibration, Photons, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers, Failure analysis, Stochastic processes

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11329, Advanced Etch Technology for Nanopatterning IX
KEYWORDS: Data modeling, Etching, Inspection, Neural networks, Photomasks, Machine learning, Optical proximity correction, Semiconducting wafers, Process modeling

Proceedings Article | 20 March 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Metrology, Data modeling, Calibration, Image processing, 3D modeling, Scanning electron microscopy, Image quality, Photomasks, Optical proximity correction, Semiconducting wafers

Proceedings Article | 26 September 2019 Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Lithography, Phase shifting, Logic, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Optical proximity correction, SRAF, Nanoimprint lithography

Showing 5 of 47 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top