As the feature size becomes smaller, it is difficult for the lithography progress to
keep pace with the acceleration of design rule shrinkage and high integration of memory device.
Extreme Ultra Violet Lithography (EUVL) is a preferred solution for the 32nm node. In this
paper, we have synthesized two types of polymers. One is based on hydroxy phenol, the other
is based on hydrocarbon acrylate type polymer. We have diversified each polymer type
according to different activation energies for deprotection reaction. In this experiment, we have
observed on the resist lithographic performance such as resolution, LER (Line Edge
Roughness), photo-sensitivity, and out-gassing during exposure. Different properties according
to activation energy were well explained by acid diffusion and polymer free-volume.