Dr. Gian Francesco Lorusso
Principal Scientist at IMEC
SPIE Involvement:
Author
Publications (64)

SPIE Journal Paper | November 30, 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Stochastic processes, Optical lithography, Integrated circuits, Line edge roughness, Extreme ultraviolet lithography, Line width roughness, Metrology, Critical dimension metrology, Photomasks, Semiconducting wafers

SPIE Journal Paper | November 10, 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Scanning electron microscopy, Line edge roughness, Materials processing, Extreme ultraviolet, Line width roughness, Etching, Lithography, Image filtering, Material characterization, Image acquisition

SPIE Journal Paper | October 13, 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Line edge roughness, Scanning electron microscopy, Fractal analysis, Metrology, Edge roughness, Etching, Lithography, Image processing, Optical lithography, Image segmentation

SPIE Journal Paper | September 12, 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Metrology, Line width roughness, Scanning electron microscopy, Digital filtering, Atomic force microscopy, Standards development, Semiconductors, Image acquisition, Image quality, Electron microscopes

SPIE Journal Paper | June 15, 2018
JM3 Vol. 17 Issue 02
KEYWORDS: Semiconducting wafers, Oxides, Transmission electron microscopy, Etching, Thin films, Ellipsometry, Electron microscopes, Wafer testing, Edge detection, Thin film devices

PROCEEDINGS ARTICLE | March 30, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Image processing, Materials processing, Image acquisition, Scanning electron microscopy, Image filtering, Extreme ultraviolet, Line width roughness, Double patterning technology, Line edge roughness, Material characterization

Showing 5 of 64 publications
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