Gianluca A. Panici
at Univ of Illinois
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Mirrors, Etching, Ions, Hydrogen, Reflectivity, Extreme ultraviolet, Reactive ion etching, EUV optics, Plasma, Tin

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Mirrors, Etching, Ions, Hydrogen, Reflectivity, Extreme ultraviolet, Reactive ion etching, EUV optics, Plasma, Tin

SPIE Journal Paper | April 7, 2017
JM3 Vol. 16 Issue 02
KEYWORDS: Tin, Plasma, Ions, Hydrogen, Etching, Extreme ultraviolet, In situ metrology, Extreme ultraviolet lithography, Data modeling, Reflection

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Gold, Mirrors, Etching, Ions, Hydrogen, Reflectivity, Extreme ultraviolet, Antennas, Reactive ion etching, EUV optics, Plasma, Tin

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Mirrors, Etching, Chemical species, Ions, Hydrogen, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Neodymium, Probability theory, EUV optics, Plasma, Tin, Oxidation

PROCEEDINGS ARTICLE | April 6, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Etching, Ions, Hydrogen, Reflectivity, Extreme ultraviolet, Plasma etching, Extreme ultraviolet lithography, Process modeling, Plasma, Tin

Showing 5 of 6 publications
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