Gianluca A. Panici
at Univ of Illinois
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 14 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Mirrors, Etching, Ions, Hydrogen, Reflectivity, Extreme ultraviolet, EUV optics, Temperature metrology, Plasma, Tin

Proceedings Article | 19 March 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Mirrors, Etching, Ions, Hydrogen, Reflectivity, Extreme ultraviolet, Reactive ion etching, EUV optics, Plasma, Tin

Proceedings Article | 16 October 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Mirrors, Etching, Ions, Hydrogen, Reflectivity, Extreme ultraviolet, Reactive ion etching, EUV optics, Plasma, Tin

SPIE Journal Paper | 7 April 2017
JM3 Vol. 16 Issue 02
KEYWORDS: Tin, Plasma, Ions, Hydrogen, Etching, Extreme ultraviolet, In situ metrology, Extreme ultraviolet lithography, Data modeling, Reflection

Proceedings Article | 24 March 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Gold, Mirrors, Etching, Ions, Hydrogen, Reflectivity, Extreme ultraviolet, Antennas, Reactive ion etching, EUV optics, Plasma, Tin

Showing 5 of 7 publications
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