Gilles Tabbone
at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 19 September 2018
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Image segmentation, Manufacturing, Inspection, Image analysis, Scanning electron microscopy, Photomasks, Back end of line, Defect inspection

Proceedings Article | 16 October 2017
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Semiconductors, Error analysis, Manufacturing, Reliability, Scanning electron microscopy, Photomasks, Mask making, Data communications, Optimization (mathematics), Back end of line

Proceedings Article | 28 September 2017
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference
KEYWORDS: Image processing, Image resolution, Image analysis, Scanning electron microscopy, Photomasks, Nanoimprint lithography

Proceedings Article | 13 July 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Data modeling, Image segmentation, Image processing, Manufacturing, Inspection, Image analysis, Photomasks, Semiconducting wafers, Standards development, Back end of line

Proceedings Article | 5 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Image processing, Error analysis, Manufacturing, Reliability, Inspection, Image analysis, Image enhancement, Neodymium, Tolerancing, Back end of line

Proceedings Article | 1 October 2013
Proc. SPIE. 8886, 29th European Mask and Lithography Conference
KEYWORDS: Metrology, Etching, Quartz, Manufacturing, Inspection, Atomic force microscopy, Time metrology, Photomasks, Critical dimension metrology, Back end of line

Showing 5 of 8 publications
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