Dr. Gim S. Chen
Sr. Process Engineer at AKrion LLC
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | December 17, 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Photomasks, Transmittance, Reticles, Chemistry, Photoresist processing, Binary data, Mask cleaning, Reflectivity, Photoresist materials, Particles

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