In this work we report the results of both theoretical and experimental strain analysis of Silicon waveguides and
couplers. Simulations of induced stress and strain distributions on photonic structures (waveguides with 450 × 220 nm
cross section) have been performed taking into account a ~375 nm thick Si3N4 straining layer. The Convergent Beam
Electron Diffraction (CBED) technique has also been employed to provide locally accurate strain measurements on
fabricated silicon rib and coupling structures across the nitride-to-silicon interface, showing a good match between
multiphysics simulations and measurements along the rib cross-section, resulting in notable attained strain levels.
Simone Sugliani, Pietro De Nicola, Giovanni Battista Montanari, Alessio Nubile, Angela Menin, Fulvio Mancarella, Paolo Vergani, Andrea Meroni, Marco Astolfi, Marco Borsetto, Guido Consonni, Roberto Longone, Marco Chiarini, Marco Bianconi, Gian Giuseppe Bentini
A surface micromachining technique of LiNbO3 substrates, based on an improved implantation-assisted wet etching process, will be presented and discussed. 2.3 μm high relief structures with optical quality surfaces were fabricated on LiNbO3 by 5 MeV Cu ion implantation through an SU-8 10 μm thick photoresist masking layer patterned by a standard photolithographic process. The LiNbO3 regions amorphized by implantation were etched in a 49% HF aqueous solution at a rate of 100 nm/s exploiting the high differential etching rate between damaged and undamaged LiNbO3 (100 nm/s against 1 nm/s). The process can be repeated to obtain higher aspect ratios. In this work the results of both single and double step processes will be presented. The sidewalls morphology of the microstructures will be also discussed. Both the surface quality and features of the manufactured structures make this technology highly promising for integrated optics and acousto/opto-fluidics.
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