Gisung Yoon
Senior Engineer at Micron Technology, Inc.
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Optical properties, Image processing, Coating, Inspection, Photomasks, Extreme ultraviolet, Neodymium, Semiconducting wafers, Liquids, Defect inspection

Proceedings Article | 8 October 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Optical lithography, Inspection, Image resolution, Photomasks, Artificial intelligence, Source mask optimization, Optical proximity correction, SRAF, Evolutionary algorithms, Resolution enhancement technologies

Proceedings Article | 1 October 2013
Proc. SPIE. 8886, 29th European Mask and Lithography Conference
KEYWORDS: Lithography, Calibration, Image processing, Scanners, Inspection, Printing, Photomasks, Source mask optimization, SRAF, Model-based design

Proceedings Article | 28 June 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Wafer-level optics, Signal to noise ratio, Defect detection, Deep ultraviolet, Inspection, Optical inspection, Printing, Photomasks, Geometrical optics, Semiconducting wafers

Proceedings Article | 8 November 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Lithographic illumination, Modulation, Polarization, Inspection, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 27 March 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Carbon, Contamination, Silicon, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Ruthenium

Showing 5 of 8 publications
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