Mr. Giuseppe Y. H. Mak
at
SPIE Involvement:
Author
Publications (2)

SPIE Journal Paper | January 1, 2005
JM3 Vol. 4 Issue 01
KEYWORDS: Monte Carlo methods, Error analysis, Phase shifts, Critical dimension metrology, Photomasks, Coherence imaging, Wavefronts, Light sources, Resolution enhancement technologies, Zernike polynomials

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Coherence imaging, Statistical analysis, Error analysis, Wavefronts, Image analysis, Monte Carlo methods, Photomasks, Critical dimension metrology, Resolution enhancement technologies, Phase shifts

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