Goji Wakamatsu
at JSR Corp
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 27 March 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Carbon, Lithography, Optical lithography, Glasses, Resistance, Fourier transforms, Chemical vapor deposition, Photoresist materials, Photomasks

Proceedings Article | 20 March 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Optical lithography, Etching, Hydrogen, Resistance, Fourier transforms, Chemical vapor deposition, Extreme ultraviolet, Double patterning technology, Critical dimension metrology, Fluorine

Proceedings Article | 26 March 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Optical lithography, Silica, Water, Manufacturing, Extreme ultraviolet lithography, Double patterning technology, Immersion lithography, Critical dimension metrology, Photoresist processing

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Optical lithography, Etching, Image processing, Manufacturing, Scanning electron microscopy, Photomasks, Double patterning technology, Photoresist processing, Semiconducting wafers

Proceedings Article | 26 March 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Optical lithography, Etching, Water, Scanning electron microscopy, Double patterning technology, Immersion lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers

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