Dr. Gong Chen
Senior Member Technical Staff at Headway Technology Inc
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Reticles, Databases, Air contamination, Error analysis, Manufacturing, Inspection, Photomasks, Semiconducting wafers, Data analysis, Defect inspection

Proceedings Article | 24 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Reticles, Databases, Air contamination, Error analysis, Manufacturing, Inspection, Photomasks, Semiconducting wafers, Data analysis, Defect inspection

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Semiconductors, Detection and tracking algorithms, Metals, Manufacturing, Printing, Photomasks, Semiconductor manufacturing, Optical proximity correction, Semiconducting wafers, Failure analysis

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Reticles, Databases, Air contamination, Error analysis, Manufacturing, Inspection, Photomasks, Semiconducting wafers, Data analysis, Defect inspection

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Lithography, Optical lithography, Etching, Image processing, Silicon, Printing, Photomasks, Photoresist processing, Semiconducting wafers, 193nm lithography

Proceedings Article | 16 November 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Semiconductors, Lithography, Optical lithography, Quartz, Image processing, Manufacturing, Image transmission, Photomasks, Semiconducting wafers, Wafer manufacturing

Showing 5 of 10 publications
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