Dr. Gongfa Li
SPIE Involvement:
Author
Publications (4)

SPIE Journal Paper | 24 January 2019
OE Vol. 58 Issue 08
KEYWORDS: Polarization, Lithography, Imaging systems, Distortion, Nanoimprint lithography, Optical engineering, Photomasks, Lithographic illumination, Zernike polynomials, Semiconducting wafers

Proceedings Article | 15 November 2018
Proc. SPIE. 10964, Tenth International Conference on Information Optics and Photonics
KEYWORDS: Optical imaging, Lithography, Optical lithography, Imaging systems, Image processing, Computer simulations, Photomasks, Optical proximity correction, Algorithm development, Resolution enhancement technologies

Proceedings Article | 7 November 2018
Proc. SPIE. 10819, Optical Metrology and Inspection for Industrial Applications V
KEYWORDS: Lithography, Data modeling, Polarization, Imaging systems, Manufacturing, Distortion, Zernike polynomials

Proceedings Article | 12 January 2018
Proc. SPIE. 10620, 2017 International Conference on Optical Instruments and Technology: Optoelectronic Imaging/Spectroscopy and Signal Processing Technology
KEYWORDS: Lithography, Imaging systems, Wavefront aberrations, Distortion, Zernike polynomials, Image transmission, Photomasks, Reconstruction algorithms, Phase measurement, Systems modeling

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