Mr. Göran Fleischer
at Qimonda Dresden GmbH & Co OHG
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | March 24, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Lithography, Metrology, Cadmium, Data modeling, Optical properties, Scanning electron microscopy, Scatterometry, Critical dimension metrology, Semiconducting wafers, Scatter measurement

PROCEEDINGS ARTICLE | April 4, 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Signal to noise ratio, Metrology, Statistical analysis, Visualization, Sensors, Calibration, Image acquisition, Interference (communication), Scanning electron microscopy, Critical dimension metrology

PROCEEDINGS ARTICLE | April 5, 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Metrology, Optical lithography, Calibration, Silicon, Scatterometry, Integration, Critical dimension metrology, Semiconducting wafers, Scatter measurement, Wafer testing

PROCEEDINGS ARTICLE | March 15, 2006
Proc. SPIE. 6155, Data Analysis and Modeling for Process Control III
KEYWORDS: Lithography, Metrology, 3D modeling, Scatterometry, Data processing, Process control, Critical dimension metrology, Semiconducting wafers, Scatter measurement, Process modeling

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Metrology, Silicon, Inspection, Scanning electron microscopy, Scatterometry, Process control, Critical dimension metrology, System integration, Semiconducting wafers, Scatter measurement

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