Gordon Chan
Engineer at Toppan Chunghwa Electronics
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 30 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Fluctuations and noise, Error analysis, Pellicles, Printing, Finite element methods, Photomasks, Lutetium, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 8 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Electronics, Etching, Manufacturing, Photomasks, Critical dimension metrology, Line edge roughness, Photoresist processing, Edge roughness, Tin, Chemically amplified resists

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