Gordon Russell
at Mentor Graphics Corp
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | July 13, 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Reticles, Databases

PROCEEDINGS ARTICLE | May 10, 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Reticles, Radon, Visualization, Databases, Etching, Photomasks, Acquisition tracking and pointing, Data conversion, Neodymium, Semiconducting wafers

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Semiconductors, Visualization, Manufacturing, Data processing, Photomasks, Integrated circuits, Optical proximity correction, Back end of line, Front end of line, Design for manufacturability

PROCEEDINGS ARTICLE | March 29, 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Target detection, Data modeling, Calibration, Error analysis, Manufacturing, Process control, Photomasks, Feedback loops, Critical dimension metrology, Process modeling

PROCEEDINGS ARTICLE | March 26, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Diffractive optical elements, Manufacturing, Computer simulations, Printing, Image quality, Photomasks, SRAF

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Semiconductors, Lithography, Manufacturing, Computer simulations, Photomasks, SRAF, Chemical elements, Tolerancing, Resolution enhancement technologies, Phase shifts

Showing 5 of 6 publications
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