Dr. Gottlieb S. Oehrlein
at Univ of Maryland College Park
SPIE Involvement:
Conference Program Committee | Conference Chair | Conference Co-Chair | Editor | Author
Publications (5)

SPIE Conference Volume | April 22, 2014

SPIE Journal Paper | December 23, 2013
JM3 Vol. 12 Issue 04
KEYWORDS: CMOS technology, Optical lithography, Plasma etching, Etching, Plasma, Semiconductors, Lithography, Extreme ultraviolet, Line edge roughness, Directed self assembly

SPIE Conference Volume | April 16, 2013

SPIE Conference Volume | April 16, 2012

PROCEEDINGS ARTICLE | March 1, 1991
Proc. SPIE. 1392, Advanced Techniques for Integrated Circuit Processing
KEYWORDS: Oxides, Polarization, Etching, Interfaces, Ions, Silicon, Integrated circuits, Reactive ion etching, Semiconducting wafers, Plasma

Conference Committee Involvement (7)
Advanced Etch Technology for Nanopatterning VII
26 February 2018 | San Jose, California, United States
Advanced Etch Technology for Nanopatterning VI
27 February 2017 | San Jose, California, United States
Advanced Etch Technology for Nanopatterning V
22 February 2016 | San Jose, California, United States
Advanced Etch Technology for Nanopatterning IV
23 February 2015 | San Jose, California, United States
Advanced Etch Technology for Nanopatterning III
24 February 2014 | San Jose, California, United States
Showing 5 of 7 published special sections
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