Dr. Greet Storms
R&D Assistant Meterology at ASML Netherlands BV
SPIE Involvement:
Author
Publications (9)

PROCEEDINGS ARTICLE | March 24, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Diffraction, Metrology, Polarization, Optical properties, Image processing, Inspection, Physics, Computer simulations, Process control, Detection theory, Semiconducting wafers, Overlay metrology, Diffraction gratings, Accuracy assessment

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Diffraction, Metrology, Etching, Scanners, Process control, Semiconducting wafers, Overlay metrology, Back end of line, Front end of line, Fin field effect transitor

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Semiconductors, Optical lithography, Etching, Manufacturing, Process control, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Yield improvement, Overlay metrology

PROCEEDINGS ARTICLE | April 5, 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Lithography, Metrology, Electroluminescence, Scanning electron microscopy, Precision measurement, Process control, Finite element methods, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 27, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Lithography, Optical lithography, Etching, Manufacturing, Photomasks, Double patterning technology, Critical dimension metrology, Neodymium, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Lithography, Metrology, Manufacturing, Electroluminescence, Scanning electron microscopy, Process control, Finite element methods, Design for manufacturing, Semiconducting wafers, Resolution enhancement technologies

Showing 5 of 9 publications
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