Dr. Greg M. Yeric
Senior Principle Engineer at ARM Inc
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Lithography, Optical lithography, Nano opto mechanical systems, Error analysis, Computer simulations, Photomasks, Shape analysis, Directed self assembly, Double patterning technology, Optical proximity correction

PROCEEDINGS ARTICLE | March 15, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Optical lithography, Metals, Legal, Optical tracking, Design for manufacturing, Photomasks, Double patterning technology, Computational lithography, Standards development, 193nm lithography, Design for manufacturability

SPIE Journal Paper | February 3, 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Lithography, Optical lithography, Photomasks, Standards development, Legal, Manufacturing, Logic, Electrochemical etching, Double patterning technology, Algorithms

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Lithography, Logic, Optical lithography, Manufacturing, Legal, Photomasks, Double patterning technology, Standards development, 193nm lithography, Design for manufacturability

PROCEEDINGS ARTICLE | October 30, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Data modeling, Calibration, Silicon, Design for manufacturing, Photomasks, Optical proximity correction, Semiconducting wafers, Statistical modeling, Process modeling

PROCEEDINGS ARTICLE | June 2, 2000
Proc. SPIE. 3998, Metrology, Inspection, and Process Control for Microlithography XIV
KEYWORDS: Monochromatic aberrations, Reticles, Diffractive optical elements, Scanning electron microscopy, Printing, Photomasks, Optical proximity correction, Mask making, Critical dimension metrology, Semiconducting wafers

Showing 5 of 6 publications
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