Dr. Gregory R. Bogart
at Symphony Acoustics Inc
SPIE Involvement:
Conference Program Committee | Author
Publications (8)

PROCEEDINGS ARTICLE | January 19, 2005
Proc. SPIE. 5592, Nanofabrication: Technologies, Devices, and Applications
KEYWORDS: Microelectromechanical systems, Oxides, Optical components, Sensors, Silicon, Fiber optics sensors, Transducers, Semiconducting wafers, Nanoelectromechanical systems, Near field optics

PROCEEDINGS ARTICLE | April 24, 2003
Proc. SPIE. 5116, Smart Sensors, Actuators, and MEMS
KEYWORDS: Microelectromechanical systems, Oxides, Reflectors, Mirrors, Switches, Optical fabrication equipment, Electrodes, Silicon, Microopto electromechanical systems, Semiconducting wafers

PROCEEDINGS ARTICLE | January 20, 2003
Proc. SPIE. 4983, MOEMS and Miniaturized Systems III
KEYWORDS: Microelectromechanical systems, Actuators, Lithography, Mirrors, Etching, Electrodes, Crystals, Silicon, Adaptive optics, Semiconducting wafers

PROCEEDINGS ARTICLE | July 21, 2000
Proc. SPIE. 3997, Emerging Lithographic Technologies IV
KEYWORDS: Etching, Silicon, Photoresist materials, Photomasks, Wet etching, Plasma etching, Helium, Semiconducting wafers, Charged-particle lithography, Plasma

PROCEEDINGS ARTICLE | August 30, 1999
Proc. SPIE. 3874, Micromachining and Microfabrication Process Technology V
KEYWORDS: Lithography, Electron beam lithography, Scattering, Etching, Dry etching, Crystals, Silicon, Photomasks, Semiconducting wafers, Charged-particle lithography

PROCEEDINGS ARTICLE | June 25, 1999
Proc. SPIE. 3676, Emerging Lithographic Technologies III
KEYWORDS: Etching, Dry etching, Crystals, Silicon, Photoresist materials, Photomasks, Wet etching, Semiconducting wafers, Charged-particle lithography, Plasma

Showing 5 of 8 publications
Conference Committee Involvement (2)
Nanofabrication: Technologies, Devices, and Applications II
23 October 2005 | Boston, MA, United States
Nanofabrication: Technologies, Devices, and Applications
25 October 2004 | Philadelphia, Pennsylvania, United States
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