Prof. Gregory H. Denbeaux
Associate Professor Nanoengineering at SUNY Polytechnic Institute
SPIE Involvement:
Author
Publications (61)

Proceedings Article | 8 April 2019
Proc. SPIE. 10960, Advances in Patterning Materials and Processes XXXVI
KEYWORDS: Polymers, Metals, Photoresist materials, Polymerization, Extreme ultraviolet, Extreme ultraviolet lithography, Antimony

Proceedings Article | 27 March 2019
Proc. SPIE. 10960, Advances in Patterning Materials and Processes XXXVI
KEYWORDS: Oxides, Metals, Ions, Photoresist materials, Extreme ultraviolet, Bismuth, Extreme ultraviolet lithography, Antimony, Photoresist developing

Proceedings Article | 25 March 2019
Proc. SPIE. 10960, Advances in Patterning Materials and Processes XXXVI
KEYWORDS: Lithography, Electron beam lithography, Photons, Diffusion, Printing, Photoresist materials, Ionization, Extreme ultraviolet, Extreme ultraviolet lithography, Chemical reactions

SPIE Journal Paper | 23 July 2018
JM3 Vol. 17 Issue 03
KEYWORDS: Polymers, Extreme ultraviolet lithography, Extreme ultraviolet, Photoresist materials, Molecules, Absorbance, Chemical reactions, Absorption, Spectroscopy, Electrodes

Proceedings Article | 28 March 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Polymers, Photons, Ionizing radiation, Electrons, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Radiation effects, Photoresist developing, Standards development

Showing 5 of 61 publications
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