Dr. Gregory H. Denbeaux
Associate Professor Nanoengineering at SUNY Polytechnic Institute
SPIE Involvement:
Author
Publications (58)

SPIE Journal Paper | July 23, 2018
JM3 Vol. 17 Issue 03
KEYWORDS: Polymers, Extreme ultraviolet lithography, Extreme ultraviolet, Photoresist materials, Molecules, Absorbance, Chemical reactions, Absorption, Spectroscopy, Electrodes

PROCEEDINGS ARTICLE | March 28, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Polymers, Photons, Ionizing radiation, Electrons, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Radiation effects, Photoresist developing, Standards development

PROCEEDINGS ARTICLE | March 27, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Metals, Chromium, Photoresist materials, Extreme ultraviolet, Bismuth, Extreme ultraviolet lithography, Semiconducting wafers, Carbon monoxide, Antimony, Tellurium

PROCEEDINGS ARTICLE | March 27, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Spectroscopy, Molecules, Hydrogen, Chromium, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Carbon monoxide, Antimony

PROCEEDINGS ARTICLE | March 21, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Polymethylmethacrylate, Polymers, Molecules, Electrons, Photoresist materials, Extreme ultraviolet, Absorbance, Extreme ultraviolet lithography, Liquids, Absorption

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Optical lithography, Contamination, Polymers, Matrices, Photons, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing

Showing 5 of 58 publications
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