Prof. Gregory S. Herman
at Oregon State University
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Oxides, Optical lithography, Annealing, X-rays, Chemistry, Oxygen, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Tin

PROCEEDINGS ARTICLE | March 21, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Electron beam lithography, Electron beams, Data modeling, Spectroscopy, Chemistry, Materials processing, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Chemical elements, Photoresist processing

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Oxides, Thin films, Lithography, Electron beam lithography, Electron beams, Metals, Electrons, Transmission electron microscopy, Line width roughness, Hafnium

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