Dr. Gregory P. Hughes Profile

Dr. Gregory P. Hughes

Senior Member/Technical Staff at SUNY Poly SEMATECH

SPIE Involvement:

Author

Publications (43)

Proceedings Article | 24 January 2012 Paper

Study of EUV mask e-beam inspection conditions for HVM

Shmoolik Mangan, C. C. Lin, Greg Hughes, Ran Brikman, Alex Goldenshtein, Vlad Kudriashov, Alon Litman, Lior Shoval, Ilan Englard

Proceedings Volume 8166, 816631 (2012) https://doi.org/10.1117/12.898854

KEYWORDS: Inspection, Reflectivity, Extreme ultraviolet, Photomasks, Scanning electron microscopy, Contamination, Scattering, Extreme ultraviolet lithography, Semiconducting wafers, Multilayers

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Proceedings Article | 24 January 2012 Paper

Study of EUV mask e-beam inspection conditions for HVM

Shmoolik Mangan, C. C. Lin, Greg Hughes, Ran Brikman, Alex Goldenshtein, Vladislav Kudriashov, Alon Litman, Lior Shoval, Ilan Englard

Proceedings Volume 8166, 816612 (2012) https://doi.org/10.1117/12.899067

KEYWORDS: Inspection, Reflectivity, Extreme ultraviolet, Photomasks, Scanning electron microscopy, Contamination, Scattering, Extreme ultraviolet lithography, Semiconducting wafers, Multilayers

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Proceedings Article | 4 April 2011 Paper

Fast mask writers: technology options and considerations

Lloyd Litt, Timothy Groves, Greg Hughes

Proceedings Volume 7970, 79700X (2011) https://doi.org/10.1117/12.882945

KEYWORDS: Photomasks, Lithography, Electron beam lithography, Semiconducting wafers, Mask making, Optical lithography, Semiconductors, Optical proximity correction, Manufacturing, Beam shaping

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Proceedings Article | 17 March 2011 Paper

The 2002 to 2010 mask survey trend analysis

Greg Hughes, David Chan

Proceedings Volume 7985, 798502 (2011) https://doi.org/10.1117/12.896880

KEYWORDS: Photomasks, Pellicles, Binary data, Optical proximity correction, Data processing, Manufacturing, Phase shifts, Microelectronics, Glasses, Printing

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Proceedings Article | 25 September 2010 Paper

Mask Industry Assessment: 2010

Greg Hughes, David Chan

Proceedings Volume 7823, 782303 (2010) https://doi.org/10.1117/12.868465

KEYWORDS: Photomasks, Microelectronics, Data processing, Photomask technology, Current controlled current source, Semiconductors

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Proceedings Article | 26 May 2010 Paper

PROVE, the next generation registration metrology tool: status report

Dirk Beyer, Patricia Gabella, Greg Hughes, Gerd Klose, Norbert Rosenkranz

Proceedings Volume 7748, 77480M (2010) https://doi.org/10.1117/12.867913

KEYWORDS: Photomasks, Metrology, Image registration, 193nm lithography, Extreme ultraviolet, Lithography, Lithographic illumination, Image resolution, Pellicles, Double patterning technology

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Proceedings Article | 14 May 2010 Paper

Mask industry assessment trend analysis: 2010

Greg Hughes, Henry Yun

Proceedings Volume 7545, 754502 (2010) https://doi.org/10.1117/12.865509

KEYWORDS: Photomasks, Microelectronics, Data processing, Lithography, Current controlled current source, Semiconductors

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Proceedings Article | 30 September 2009 Paper

Mask industry assessment: 2009

Greg Hughes, Henry Yun

Proceedings Volume 7488, 748803 (2009) https://doi.org/10.1117/12.832722

KEYWORDS: Photomasks, Binary data, Optical proximity correction, Pellicles, Glasses, Photomask technology, Data processing, Manufacturing, Logic, Inspection

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Proceedings Article | 27 May 2009 Paper

Mask industry assessment trend analysis

Greg Hughes, Henry Yun

Proceedings Volume 7470, 747003 (2009) https://doi.org/10.1117/12.835157

KEYWORDS: Photomasks, Binary data, Pellicles, Optical proximity correction, Data processing, Phase shifts, Manufacturing, Microelectronics, Printing, Glasses

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Proceedings Article | 18 March 2009 Paper

Estimation of cost comparison of lithography technologies at the 22-nm half-pitch node

Andrea Wüest, Andrew Hazelton, Greg Hughes

Proceedings Volume 7271, 72710Y (2009) https://doi.org/10.1117/12.814255

KEYWORDS: Extreme ultraviolet lithography, Lithography, Photomasks, Semiconducting wafers, Etching, Reticles, Double patterning technology, Metrology, Process modeling

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Proceedings Article | 4 December 2008 Paper

Cost of ownership for future lithography technologies

Andrew Hazelton, Andrea Wüest, Greg Hughes, Lloyd Litt, Frank Goodwin

Proceedings Volume 7140, 71401Q (2008) https://doi.org/10.1117/12.804711

KEYWORDS: Extreme ultraviolet lithography, Lithography, Photomasks, Semiconducting wafers, Etching, Reticles, Metrology, Double patterning technology, Process modeling

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Proceedings Article | 17 October 2008 Paper

Mask industry assessment: 2008

Greg Hughes, Henry Yun

Proceedings Volume 7122, 712204 (2008) https://doi.org/10.1117/12.802143

KEYWORDS: Photomasks, Binary data, Optical proximity correction, Pellicles, Data conversion, Glasses, Photomask technology, Data processing, Manufacturing, Logic

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Proceedings Article | 19 May 2008 Paper

Mask and wafer cost of ownership (COO) from 65 to 22 nm half-pitch nodes

Greg Hughes, Lloyd Litt, Andrea Wüest, Shyam Palaiyanur

Proceedings Volume 7028, 70281P (2008) https://doi.org/10.1117/12.793067

KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Extreme ultraviolet, Manufacturing, Extreme ultraviolet lithography, Optical proximity correction, Optical lithography, Wafer-level optics, Double patterning technology

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Proceedings Article | 19 May 2008 Paper

Predicting lithography costs: guidance for ≤ 32 nm patterning solutions

Andrew Hazelton, Andrea Wüest, Greg Hughes, Michael Lercel

Proceedings Volume 7028, 70283N (2008) https://doi.org/10.1117/12.793129

KEYWORDS: Lithography, Extreme ultraviolet, Photomasks, Reticles, Double patterning technology, Optical lithography, Extreme ultraviolet lithography, Etching, Semiconducting wafers, Manufacturing

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Proceedings Article | 2 May 2008 Paper

Mask industry assessment trend analysis

Gilbert Shelden, Patricia Marmillion, Greg Hughes

Proceedings Volume 6792, 679202 (2008) https://doi.org/10.1117/12.798511

KEYWORDS: Photomasks, Binary data, Optical proximity correction, Data processing, Pellicles, Phase shifts, Data conversion, Microelectronics, Printing, Manufacturing

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Proceedings Article | 23 October 2007 Paper

Mask Industry Assessment: 2007

Gilbert Shelden, Patricia Marmillion, Greg Hughes

Proceedings Volume 6730, 673003 (2007) https://doi.org/10.1117/12.730158

KEYWORDS: Photomasks, Binary data, Optical proximity correction, Pellicles, Glasses, Manufacturing, Data processing, Photomask technology, Inspection, Logic

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Proceedings Article | 21 March 2006 Paper

Printability of quartz defects in a production Cr-less mask process

Gregory Hughes, Susan MacDonald, John Riddick, Anthony Nhiev, Jason Hickethier

Proceedings Volume 6154, 615446 (2006) https://doi.org/10.1117/12.656525

KEYWORDS: Photomasks, Quartz, Inspection, Etching, Printing, Scanning electron microscopy, Lithography, Semiconducting wafers, Chromium, Phase shifts

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Proceedings Article | 8 November 2005 Paper

Design and fabrication of highly complex topographic nano-imprint template for dual Damascene full 3-D imprinting

Susan MacDonald, Greg Hughes, Michael Stewart, Frank Palmieri, C. Grant Willson

Proceedings Volume 5992, 59922F (2005) https://doi.org/10.1117/12.632312

KEYWORDS: Metals, Etching, Quartz, Copper, Photomasks, Optical lithography, Manufacturing, Lithography, Semiconducting wafers, Dielectrics

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Proceedings Article | 12 May 2005 Paper

Imaging study of positive and negative tone weak phase-shifted 65 nm node contacts

James Beach, John Petersen, Robert Greenway, Mark Maslow, Susan MacDonald, Lee Margolis, Gregory Hughes

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598535

KEYWORDS: Photomasks, Lithography, Reticles, Phase shifts, Quartz, Etching, Manufacturing, Vestigial sideband modulation, Critical dimension metrology, Nanoimprint lithography

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Proceedings Article | 10 May 2005 Paper

Advanced mask metrology enabling characterization of imprint lithography templates

L. Myron, Liraz Gershtein, Gidi Gottlieb, Bob Burkhardt, Andrew Griffiths, David Mellenthin, Kevin Rentzsch, Susan MacDonald, Greg Hughes

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.603718

KEYWORDS: Semiconducting wafers, Lithography, Chromium, Photomasks, Quartz, Critical dimension metrology, Etching, Metrology, Photoresist processing, Cadmium

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Proceedings Article | 6 December 2004 Paper

Phase standard based on profilometer metrology standard

Gregory Hughes, Cindy Goodman, Gunter Antesberger, Stefan Burges, Troy Morrison, Alex Buxbaum

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.581222

KEYWORDS: Calibration, Photomasks, Metrology, Quartz, Phase shifts, Laser metrology, Profilometers, Phase measurement, Laser optics, Etching

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Proceedings Article | 20 August 2004 Paper

The study of phase angle effects to wafer process window using 193-nm EAPSM in a 300-mm wafer manufacturing environment

William Chou, Shih Yen, J. Wu, W. Shieh, Mars Chuang, George Fan, Chin Chih Tseng, Gregory Hughes, Susan MacDonald, Carrie Holiday, Gong Chen

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557754

KEYWORDS: Semiconducting wafers, Photomasks, Lithography, Printing, Etching, Wafer manufacturing, Quartz, 193nm lithography, Scanners, Computer simulations

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Proceedings Article | 28 May 2004 Paper

Study of OPC for AAPSM reticles using various mask fabrication techniques

Gregory Hughes, Denny Kamaruddin, Kent Nakagawa, Susan MacDonald, Bill Wilkinson, Craig West, Keuntaek Park

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536138

KEYWORDS: Photomasks, Semiconducting wafers, Data modeling, Optical proximity correction, Etching, Mask making, Photoemission spectroscopy, Image analysis, Chromium, Reticles

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Proceedings Article | 28 May 2004 Paper

Analysis of off-axis illumination-based phase-edge/chromeless mask technologies

Ebo Croffie, Kunal Taravade, Neal Callan, Keuntaek Park, Gregory Hughes

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536172

KEYWORDS: Photomasks, Reticles, Data conversion, Semiconducting wafers, Manufacturing, Lithography, Printing, Scanning electron microscopy, Phase shifts, Lithographic illumination

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Proceedings Article | 28 May 2004 Paper

Through pitch intensity balancing and phase error analysis of 193-nm alternating phase shift masks

Kent Nakagawa, Gregory Hughes, Keuntaek Park, Peter Buck

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535956

KEYWORDS: Photomasks, Etching, Phase shifts, Wet etching, Error analysis, Manufacturing, Mask making, Lithography, Quartz, 193nm lithography

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Proceedings Article | 17 December 2003 Paper

Manufacturing of ArF chromeless hard shifter for 65-nm technology

Keun-Taek Park, Laurent Dieu, Greg Hughes, Kent Green, Ebo Croffie, Kunal Taravade

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518252

KEYWORDS: Optical design, Photomasks, Quartz, Etching, Semiconducting wafers, Printing, Critical dimension metrology, Manufacturing, Line edge roughness, Tolerancing

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Proceedings Article | 26 June 2003 Paper

Strategies for predictive control of chrome stress-induced registration errors

Alexander Wei, Gregory Hughes, Aaron Chalekian, Lawrence Mackey, Andrew Mikkelson, Roxann Engelstad

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485496

KEYWORDS: Photomasks, Image registration, Etching, Distortion, Optical lithography, Reticles, Yield improvement, Manufacturing, Chemical elements, Finite element methods

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Proceedings Article | 26 June 2003 Paper

Mighty high-T lithography for 65-nm generation contacts

Will Conley, Patrick Montgomery, Kevin Lucas, Lloyd Litt, John Maltabes, Laurent Dieu, Gregory Hughes, David Mellenthin, Robert Socha, Eric Fanucchi, Arjan Verhappen, Kurt Wampler, Linda Yu, Erika Schaefer, Shawn Cassel, Jan Kuijten, Wil Pijnenburg, Vincent Wiaux, Geert Vandenberghe

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485499

KEYWORDS: Photomasks, Lithography, Inspection, Reticles, Optical lithography, Lithographic illumination, Binary data, Manufacturing, 193nm lithography, Semiconducting wafers

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Proceedings Article | 27 December 2002 Paper

Advanced 193 tri-tone EAPSM (9% to 18%) for 65-nm node

Laurent Dieu, Eric Fanucchi, Greg Hughes, John Maltabes, David Mellenthin, Will Conley, Lloyd Litt, Kevin Lucas, Robert Socha, Kurt Wampler, Arjan Verhappen, Jan-Pieter Kiujten

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467783

KEYWORDS: Reticles, Inspection, Multilayers, Tin, Manufacturing, Lithography, Etching, Photomasks, Process control, Transmittance

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Proceedings Article | 30 July 2002 Paper

Effect of quartz phase etch on 193-nm alternating phase-shift mask performance for the 100-nm node

Kyle Patterson, Lloyd Litt, John Maltabes, Greg Hughes, Trish Robertson, B. Montgomery

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474481

KEYWORDS: Reticles, Photomasks, Data modeling, Etching, Quartz, Semiconducting wafers, Optical lithography, Phase shifts, Lithography, Phase shifting

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Proceedings Article | 30 July 2002 Paper

Aberration determination in early 157-nm exposure system

Bruce Smith, Will Conley, Cesar Garza, Jeff Meute, Daniel Miller, Georgia Rich, Victoria Graffenberg, Kim Dean, Shashikant Patel, Arnie Ford, James Foster, Marco Moers, Kevin Cummings, James Webb, Paul Dewa, Azeddine Zerrade, Susan MacDonald, Greg Hughes, Peter Dirksen

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474551

KEYWORDS: Photomasks, Monochromatic aberrations, Scanning electron microscopy, Image processing, Lithography, Manufacturing, Imaging systems, Wavefronts, Zernike polynomials, Edge detection

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Proceedings Article | 11 March 2002 Paper

ArF (193-nm) alternating aperture PSM quartz defect repair and printability for 100-nm node

Jerry Chen, John Riddick, Matt Lamantia, Azeddine Zerrade, Robert Henderson, Greg Hughes, Cyrus Tabery, Khoi Phan, Chris Spence, Amy Winder, William Stanton, Eugene Delarosa, John Maltabes, Cecilia Philbin, Lloyd Litt, Anthony Vacca, Scott Pomeroy

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458362

KEYWORDS: Quartz, Photomasks, Semiconducting wafers, Scanning electron microscopy, Etching, Atomic force microscopy, Ions, Reticles, Inspection, Critical dimension metrology

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Proceedings Article | 14 September 2001 Paper

Binary halftone chromeless PSM technology for quarter-lambda optical lithography

J. Fung Chen, John Petersen, Robert Socha, Thomas Laidig, Kurt Wampler, Kent Nakagawa, Greg Hughes, Susan MacDonald, Waiman Ng

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435751

KEYWORDS: Halftones, Binary data, Optical proximity correction, Photomasks, Reticles, Scanning electron microscopy, Manufacturing, Printing, Mask making, Lithography

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Proceedings Article | 5 July 2000 Paper

OPC beyond 0.18 mm: OPC on PSM gates

Franklin Schellenberg, Olivier Toublan, Nicolas Cobb, Emile Sahouria, Greg Hughes, Susan MacDonald, Craig West

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388942

KEYWORDS: Photomasks, Reticles, Optical proximity correction, Phase shifts, Phase shifting, Semiconducting wafers, Lithography, Manufacturing, Phase measurement, Etching

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Proceedings Article | 30 June 1999 Paper

Optical superlattices as phase-shift masks for microlithography

Peter Carcia, Roger French, Gillian Reynolds, Greg Hughes, Charlie Torardi, M. Reilly, M. Lemon, C. Miao, David Jones, L. Wilson, Laurent Dieu

Proceedings Volume 3790, (1999) https://doi.org/10.1117/12.351257

KEYWORDS: Photomasks, Etching, Multilayers, Optical lithography, Quartz, Chromium, Transmittance, Superlattices, Optical properties, Reactive ion etching

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Proceedings Article | 18 December 1998 Paper

TiSi-nitride attenuating phase-shift photomask for 193-nm lithography

Gillian Reynolds, Roger French, Peter Carcia, Charlie Torardi, Greg Hughes, David Jones, M. Lemon, M. Reilly, L. Wilson, C. Miao

Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332857

KEYWORDS: Etching, Photomasks, Lithography, Quartz, Transmittance, Chemistry, Dry etching, Reactive ion etching, Chromium, Wet etching

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Proceedings Article | 1 September 1998 Paper

Detection of 60-deg phase defects on alternating PSMs

Chris Spence, David Emery, Larry Zurbrick, Durai Prakash, X. Chang, Steve Khanna, Brent Leback, Eiji Tsujimoto, Greg Hughes, Baorui Yang

Proceedings Volume 3412, (1998) https://doi.org/10.1117/12.328859

KEYWORDS: Inspection, Reticles, Photomasks, Deep ultraviolet, Detection and tracking algorithms, Algorithm development, Defect detection, Phase shifts, Semiconducting wafers, Etching

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Proceedings Article | 12 February 1997 Open Access

Detection of submicron phase defects on multiphase random logic reticles

Chris Spence, John Nistler, William Arnold, David Emery, Larry Zurbrick, Durai Prakash, X. Chang, Steve Khanna, Brent Leback, Eiji Tsujimoto, Greg Hughes

Proceedings Volume 3236, (1997) https://doi.org/10.1117/12.301195

KEYWORDS: Inspection, Reticles, Detection and tracking algorithms, Photomasks, Deep ultraviolet, Etching, Phase shift keying, Algorithm development, Defect detection, Phase shifts

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Proceedings Article | 8 December 1995 Paper

Embedded attenuating phase-shift mask: printability of defects

Rajeev Singh, Alvina Williams, Chi-Min Yuan, Greg Hughes, G. Foss, Ronald Martino

Proceedings Volume 2621, (1995) https://doi.org/10.1117/12.228181

KEYWORDS: Photomasks, Critical dimension metrology, Semiconducting wafers, Phase shifts, Manufacturing, Lithography, Oxides, Scanning electron microscopy, Inspection, Cadmium

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Proceedings Article | 7 December 1994 Paper

Chromium-based attenuated embedded shifter preproduction

Franklin Kalk, Roger French, H. Ufuk Alpay, Greg Hughes

Proceedings Volume 2322, (1994) https://doi.org/10.1117/12.195825

KEYWORDS: Phase shifts, Photomasks, Inspection, Etching, Scanning electron microscopy, Photomask technology, Phase shifting, Dry etching, Absorbance, Optical inspection

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Proceedings Article | 3 November 1994 Paper

Attenuated phase-shifting photomasks fabricated from Cr-based embedded shifter blanks

Franklin Kalk, Roger French, H. Ufuk Alpay, Greg Hughes

Proceedings Volume 2254, (1994) https://doi.org/10.1117/12.191963

KEYWORDS: Photomasks, Phase shifts, Inspection, Etching, Deep ultraviolet, X-ray technology, Phase shifting, Printing, Reflectivity, Opacity

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Proceedings Article | 1 January 1992 Paper

Issues associated with the commercialization of phase-shift masks

John Nistler, Greg Hughes, Andrew Muray, James Wiley

Proceedings Volume 1604, (1992) https://doi.org/10.1117/12.56947

KEYWORDS: Photomasks, Phase shifts, Etching, Quartz, Reticles, Semiconducting wafers, Scanning electron microscopy, Inspection, Manufacturing, Gallium

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