Dr. Gregory P. Hughes
Senior Member/Technical Staff at SUNY Poly SEMATECH
SPIE Involvement:
Conference Program Committee | Author
Publications (43)

Proceedings Article | 24 January 2012
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Multilayers, Contamination, Scattering, Inspection, Reflectivity, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 24 January 2012
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Multilayers, Contamination, Scattering, Inspection, Reflectivity, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 4 April 2011
Proc. SPIE. 7970, Alternative Lithographic Technologies III
KEYWORDS: Semiconductors, Lithography, Electron beam lithography, Optical lithography, Manufacturing, Photomasks, Beam shaping, Optical proximity correction, Mask making, Semiconducting wafers

Proceedings Article | 17 March 2011
Proc. SPIE. 7985, 27th European Mask and Lithography Conference
KEYWORDS: Glasses, Manufacturing, Pellicles, Printing, Data processing, Microelectronics, Photomasks, Optical proximity correction, Binary data, Phase shifts

Proceedings Article | 25 September 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Semiconductors, Data processing, Microelectronics, Photomasks, Photomask technology, Current controlled current source

Showing 5 of 43 publications
Conference Committee Involvement (3)
Photomask and Next-Generation Lithography Mask Technology XIII
18 April 2006 | Yokohama, Japan
Photomask Technology
9 September 2003 | Monterey, California, United States
Photomask Technology
1 October 2002 | Monterey, CA, United States
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