Dr. Gregory M. Wallraff
Staff Scientist at IBM Research Almaden
SPIE Involvement:
Conference Program Committee | Author
Publications (46)

Proceedings Article | 16 October 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Photons, Molecules, Electrons, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography

Proceedings Article | 27 March 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Lithography, Lithium, Polymers, Image processing, Ions, Reflectivity, Photoresist processing, Semiconducting wafers, Standards development, Image quality standards

Proceedings Article | 29 March 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Glasses, Scanning electron microscopy, Photoresist materials, Extreme ultraviolet, Line edge roughness, Analog electronics, Photomicroscopy, Photoresist processing, Semiconducting wafers, Resist chemistry

Proceedings Article | 16 April 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Electron beam lithography, Polymers, Glasses, Spectroscopy, Image resolution, Atomic force microscopy, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness

Proceedings Article | 16 April 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Visualization, Polymers, Video, Luminescence, Interfaces, Optical tracking, Video processing, Critical dimension metrology, Photoresist processing, Semiconducting wafers

Proceedings Article | 25 September 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Deep ultraviolet, Photography, Photomasks, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Standards development

Showing 5 of 46 publications
Conference Committee Involvement (6)
Advances in Resist Materials and Processing Technology XXVIII
28 February 2011 | San Jose, California, United States
Advances in Resist Materials and Processing Technology XXVII
22 February 2010 | San Jose, California, United States
Advances in Resist Materials and Processing Technology XXVI
23 February 2009 | San Jose, California, United States
Advances in Resist Materials and Processing Technology XXV
25 February 2008 | San Jose, California, United States
Advances in Resist Materials and Processing Technology XXIV
26 February 2007 | San Jose, California, United States
Showing 5 of 6 published special sections
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