Grozdan Grozev
at FUJIFILM Electronic Materials Europe NV
SPIE Involvement:
Publications (7)

Proceedings Article | 24 March 2017 Presentation + Paper
Bernd Küchler, Thomas Mülders, Hironobu Taoka, Weimin Gao, Ulrich Klostermann, Sou Kamimura, Grozdan Grozev, Masahiro Yoshidome, Michihiro Shirakawa, Waikin Li
Proceedings Volume 10147, 101470F (2017)
KEYWORDS: Semiconducting wafers, Photoresist processing, Thin films, Computational lithography, Lithography, 3D modeling, Data modeling, Calibration, Polymers, Image processing

Proceedings Article | 13 March 2012 Paper
Tamer Coskun, Huixiong Dai, Vishnu Kamat, Ching-Mei Hsu, Gaetano Santoro, Chris Ngai, Mario Reybrouck, Grozdan Grozev, Hsu-Ting Huang
Proceedings Volume 8326, 83260V (2012)
KEYWORDS: Photomasks, Source mask optimization, Semiconducting wafers, Image processing, Electroluminescence, Standards development, Nanoimprint lithography, Optical lithography, 3D modeling, Data modeling

Proceedings Article | 12 June 2003 Paper
Proceedings Volume 5039, (2003)
KEYWORDS: Lithography, Semiconducting wafers, Etching, Optical lithography, Photoresist processing, Photomasks, Cadmium, Binary data, Polymers, 193nm lithography

Proceedings Article | 24 July 2002 Paper
Proceedings Volume 4690, (2002)
KEYWORDS: Etching, Photomasks, Semiconducting wafers, Binary data, Photoresist processing, Reticles, Oxides, Electroluminescence, Lithography, Temperature metrology

Proceedings Article | 26 April 2001 Paper
Proceedings Volume 4404, (2001)
KEYWORDS: Etching, Oxides, Reticles, Photoresist processing, Photomasks, Semiconducting wafers, Phase shifts, Electroluminescence, Imaging systems, Binary data

Showing 5 of 7 publications
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