Guangming Xiao
Sr Director of Product Engineering at Synopsys Inc
SPIE Involvement:
Publications (35)

Proceedings Article | 10 April 2024 Presentation
Proceedings Volume 12954, 1295413 (2024)
KEYWORDS: Photomasks, Deep ultraviolet, Optical proximity correction, Extreme ultraviolet lithography, Ecosystems, Lithography, Extreme ultraviolet, Yield improvement, Source mask optimization, Printing

SPIE Journal Paper | 20 December 2023
JM3, Vol. 22, Issue 04, 041606, (December 2023)
KEYWORDS: Optical proximity correction, Extreme ultraviolet lithography, Lithography, Optical lithography, Machine learning, Extreme ultraviolet, Semiconducting wafers, Education and training, Industry, Source mask optimization

Proceedings Article | 25 May 2022 Presentation + Paper
Proceedings Volume 12054, 1205407 (2022)
KEYWORDS: Photomasks, Optical proximity correction, Optical lithography, Lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Machine learning, Semiconducting wafers, Manufacturing, Deep ultraviolet

Proceedings Article | 26 March 2020 Paper
Proceedings Volume 11328, 113281D (2020)
KEYWORDS: Data modeling, Optical proximity correction, Photomasks, Lithography, Machine learning, Statistical modeling, Error analysis, Semiconducting wafers, Optimization (mathematics), Optical lithography

Proceedings Article | 23 March 2020 Presentation + Paper
Proceedings Volume 11328, 1132806 (2020)
KEYWORDS: Photomasks, Lithography, Optical proximity correction, Bridges, Data analysis, Semiconducting wafers, Resolution enhancement technologies, SRAF

Showing 5 of 35 publications
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