Guangming Xiao
at Synopsys Inc
SPIE Involvement:
Author
Publications (32)

Proceedings Article | 26 March 2020
Proc. SPIE. 11328, Design-Process-Technology Co-optimization for Manufacturability XIV
KEYWORDS: Lithography, Optical lithography, Data modeling, Error analysis, Photomasks, Machine learning, Optical proximity correction, Optimization (mathematics), Semiconducting wafers, Statistical modeling

Proceedings Article | 23 March 2020
Proc. SPIE. 11328, Design-Process-Technology Co-optimization for Manufacturability XIV
KEYWORDS: Lithography, Bridges, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Resolution enhancement technologies, Data analysis

Proceedings Article | 5 April 2019
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Lithography, Optical lithography, Manufacturing, 3D modeling, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Electromagnetism, Stochastic processes, EUV optics

Proceedings Article | 20 March 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Optical lithography, Calibration, Manufacturing, Computer simulations, 3D modeling, Photomasks, Source mask optimization, Optical proximity correction, Photoresist processing

Proceedings Article | 28 September 2017
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference
KEYWORDS: Lithography, Optical lithography, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Resolution enhancement technologies

Showing 5 of 32 publications
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