Guangming Xiao
at Synopsys Inc
SPIE Involvement:
Author
Publications (30)

Proceedings Article | 5 April 2019
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Lithography, Optical lithography, Manufacturing, 3D modeling, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Electromagnetism, Stochastic processes, EUV optics

Proceedings Article | 20 March 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Optical lithography, Calibration, Manufacturing, Computer simulations, 3D modeling, Photomasks, Source mask optimization, Optical proximity correction, Photoresist processing

Proceedings Article | 28 September 2017
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference
KEYWORDS: Lithography, Optical lithography, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Resolution enhancement technologies

Proceedings Article | 4 April 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Lithography, Optical lithography, Atrial fibrillation, Image processing, Manufacturing, Photomasks, Source mask optimization, Optical proximity correction, Semiconducting wafers

Proceedings Article | 24 March 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Optical lithography, Data modeling, 3D modeling, Scanning electron microscopy, Source mask optimization, Computational lithography, Optical proximity correction, Optimization (mathematics), Photoresist processing

Proceedings Article | 24 March 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Reticles, Optical lithography, Atrial fibrillation, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

Showing 5 of 30 publications
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