Guanyong Yan
at Brion Technologies (Shenzhen) Co., Ltd.
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 23 March 2020
Proc. SPIE. 11327, Optical Microlithography XXXIII
KEYWORDS: Metrology, Data modeling, Calibration, Etching, Image processing, Scanning electron microscopy, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Performance modeling

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