Guen-Ho Hwang
at Photronics Inc
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | May 27, 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Electron beam lithography, Electron beams, Dry etching, Polymers, Image processing, Photoresist materials, Adsorption, Photoresist processing, Photoresist developing, Liquids

PROCEEDINGS ARTICLE | September 23, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Polishing, Etching, Particles, Ceramics, Resistance, Surface roughness, Scanning electron microscopy, Raw materials, Plasma treatment, Plasma

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Backscatter, Scattering, Dry etching, Scanning electron microscopy, Photomasks, SRAF, Critical dimension metrology, Photoresist processing, Vestigial sideband modulation, Resolution enhancement technologies

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Lithography, Optical lithography, Etching, Dry etching, Capillaries, Manufacturing, Photoresist materials, Photomasks, SRAF, Photoresist processing

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