Dr. Guenter Hess
at LIMO GmbH
SPIE Involvement:
Author
Publications (21)

Proceedings Article | 15 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Electron beam lithography, Etching, Dry etching, Manufacturing, Inspection, Reflectivity, Scanning electron microscopy, Photomasks, Extreme ultraviolet lithography, Mask making

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Phase shifting, Optical lithography, Silica, Etching, Scanners, Photomasks, Tantalum, Semiconducting wafers, Phase shifts

Proceedings Article | 21 June 2006
Proc. SPIE. 6281, 22nd European Mask and Lithography Conference
KEYWORDS: Lithography, Reticles, Etching, Image processing, Coating, Reflectivity, Printing, Photomasks, Extreme ultraviolet, Tolerancing

Proceedings Article | 23 March 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Electron beam lithography, Etching, Quartz, Manufacturing, Chromium, Photomasks, Beam shaping, Nanoimprint lithography, Photoresist processing, Chemically amplified resists

Proceedings Article | 22 March 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Multilayers, Polishing, Etching, Dry etching, Coating, Manufacturing, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

Showing 5 of 21 publications
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