Dr. Guido Hergenhan
at JENOPTIK Optical Systems GmbH
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Optical components, Silicon, Extreme ultraviolet, Etching, Isotropic etching, Chemical elements, Extreme ultraviolet lithography, Chromium, Ultra low expansion glass

Proceedings Article | 21 March 2008 Paper
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Integrated optics, Scanners, Curtains, Electrodes, Reliability, Xenon, EUV optics

Proceedings Article | 15 March 2007 Paper
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Extreme ultraviolet, Plasma, Electrodes, Tin, Extreme ultraviolet lithography, Xenon, Prototyping, Manufacturing, Integrated optics, Laser applications

Proceedings Article | 23 March 2006 Paper
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Extreme ultraviolet, Plasma, Electrodes, Xenon, Tin, Manufacturing, Extreme ultraviolet lithography, High volume manufacturing, Hydrogen, Prototyping

Proceedings Article | 6 May 2005 Paper
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Extreme ultraviolet, Plasma, Electrodes, Xenon, Tin, Integrated optics, EUV optics, Visible radiation, Optical filters, Metrology

Showing 5 of 11 publications
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