Dr. Guido Schiffelers
Principal Architect at ASML Netherlands BV
SPIE Involvement:
Author
Publications (19)

Proceedings Article | 26 September 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Diffraction, Phase modulation, Metals, Phase shift keying, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Nanoimprint lithography, Semiconducting wafers

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Data modeling, Linear filtering, Scanning electron microscopy, Photomasks, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Stochastic processes

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Lithography, Metrology, Optical lithography, Statistical analysis, Etching, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Stochastic processes

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Photoresist materials, Extreme ultraviolet lithography

Proceedings Article | 3 October 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Mirrors, Metrology, Scanners, Scanning electron microscopy, Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Stochastic processes

Showing 5 of 19 publications
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