Dr. Guido Schriever
at MPI für Dynamik und Selbstorganisation
SPIE Involvement:
Author
Publications (26)

SPIE Journal Paper | 29 May 2012
JM3 Vol. 11 Issue 02
KEYWORDS: Tin, Plasma, Extreme ultraviolet, Gas lasers, Extreme ultraviolet lithography, Photons, Mirrors, Light sources, Pulsed laser operation, Carbon monoxide

Proceedings Article | 20 March 2010 Paper
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Lithography, Electrodes, Scanners, Ultraviolet radiation, Reliability, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Plasma, Tin

Proceedings Article | 18 March 2009 Paper
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Mirrors, Optical design, Reflectivity, Solids, Extreme ultraviolet, Integrated optics, Extreme ultraviolet lithography, Optics manufacturing, Ruthenium, EUV optics

Proceedings Article | 18 March 2009 Paper
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Curtains, Electrodes, Scanners, Reliability, Xenon, Extreme ultraviolet, Integrated optics, Extreme ultraviolet lithography, Plasma, Tin

Proceedings Article | 4 December 2008 Paper
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Energy efficiency, Capacitors, Electrodes, Scanners, Xenon, Extreme ultraviolet, Extreme ultraviolet lithography, Prototyping, Plasma, Tin

Showing 5 of 26 publications
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