Guillaume Claveau
SPIE Involvement:
Publications (10)

Proceedings Article | 19 March 2018 Paper
P. Pimenta-Barros, G. Claveau, M. Argoud, Z. Chalupa, N. Allouti, C. Comboroure, G. Chamiot-Maitral, N. Posseme, L. Pain, R. Tiron, C. Navarro, C. Nicolet, I. Cayrefourcq
Proceedings Volume 10584, 105840C (2018)
KEYWORDS: Etching, Silicon, Ultraviolet radiation, Directed self assembly, Polymethylmethacrylate, Scanning electron microscopy, Plasma, Nanowires, Line width roughness, Surface properties

Proceedings Article | 10 April 2017 Presentation + Paper
S. Landis, H. Teyssedre, G. Claveau, I. Servin, F. Delachat, M. L. Pourteau, A. Gharbi, P. Pimenta Barros, R. Tiron, L. Nouri, N. Possemé, M. May, P. Brianceau, S. Barnola, Y. Blancquaert, J. Pradelles, P. Essomba, A. Bernadac, B. Dal'zotto, S. Bos, M. Argoud, G. Chamiot-Maitral, A. Sarrazin, C. Tallaron, C. Lapeyre, L. Pain
Proceedings Volume 10149, 101490K (2017)
KEYWORDS: Directed self assembly, Lithography, Line width roughness, Nanoimprint lithography, Semiconducting wafers, Etching, Electron beam lithography, System on a chip, Critical dimension metrology, Photoresist processing

Proceedings Article | 27 March 2017 Paper
Masahiko Harumoto, Harold Stokes, Yuji Tanaka, Koji Kaneyama, Chalres Pieczulewski, Masaya Asai, Maxime Argoud, Isabelle Servin, Gaëlle Chamiot-Maitral, Guillaume Claveau, Raluca Tiron, Ian Cayrefourcq
Proceedings Volume 10146, 101461X (2017)
KEYWORDS: Directed self assembly, Optical lithography, Thin film coatings, Line width roughness, Annealing, Oxygen, Scanning electron microscopy, Atmospheric modeling, Semiconducting wafers, Polymers

Proceedings Article | 27 March 2017 Presentation + Paper
Proceedings Volume 10146, 101460W (2017)
KEYWORDS: Directed self assembly, Annealing, Optical lithography, Polymers, Scanning electron microscopy, Semiconducting wafers, Silicon, Line width roughness, Glasses, Ultraviolet radiation

Proceedings Article | 21 March 2017 Paper
G. Claveau, M. Argoud, P. Pimenta-Barros, G. Chamiot-Maitral, R. Tiron, X. Chevalier, C. Navarro
Proceedings Volume 10144, 1014411 (2017)
KEYWORDS: Self organized materials, Line width roughness, Line edge roughness, Optical lithography, Polymethylmethacrylate, Directed self assembly, Immersion lithography, Etching, Critical dimension metrology, Macromolecules, Applied physics, Ultraviolet radiation, Lithography, Photomasks, 193nm lithography

Showing 5 of 10 publications
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