Dr. Guillaume Gey
at POLLEN Metrology
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 25 March 2019
Proc. SPIE. 10960, Advances in Patterning Materials and Processes XXXVI
KEYWORDS: Metrology, Data modeling, Image processing, Image analysis, Machine learning, Line edge roughness, Process modeling, Engineering education, Process engineering, Data analysis

Proceedings Article | 20 March 2019
Proc. SPIE. 10963, Advanced Etch Technology for Nanopatterning VIII
KEYWORDS: Semiconductors, Databases, Image processing, Image analysis, Scanning electron microscopy, Transmission electron microscopy, Machine learning, Plasma etching, Process engineering, Data analysis

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