Guillaume Schelcher
at IMEC
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 25 June 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Lithography, Metrology, Optical lithography, Inspection, Capacitance, Process control, Machine learning

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Oxides, Diffractive optical elements, Etching, Resistance, Scatterometry, Capacitance, Process control, Machine learning, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Logic, Error analysis, Copper, Inspection, Scanning electron microscopy, Wafer inspection, Photomasks, Overlay metrology, Process modeling

Proceedings Article | 20 March 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Optical lithography, Diffractive optical elements, Etching, Image processing, Atomic layer deposition, Deposition processes, Critical dimension metrology, Semiconducting wafers, Plasma

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