Dr. Guillaume Schelcher
at imec
SPIE Involvement:
Publications (7)

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12955, 129550O (2024) https://doi.org/10.1117/12.3010421
KEYWORDS: Semiconducting wafers, Overlay metrology, Cross validation, Process control, Logic, Metrology, Simulations, Scanning electron microscopy, Lithography

Proceedings Article | 1 December 2022 Presentation + Paper
Roy Anunciado, Jisun Lee, Ellaheh Barzegar, Stefan van der Sanden, Guillaume Schelcher, Stijn Schoofs
Proceedings Volume 12292, 122920J (2022) https://doi.org/10.1117/12.2637772
KEYWORDS: Line edge roughness, Etching, Semiconducting wafers, Optical lithography, Critical dimension metrology, Amorphous silicon, Scanning electron microscopy, Dielectrics, Overlay metrology, Photomasks

Proceedings Article | 22 February 2021 Presentation
Proceedings Volume 11611, 116110Q (2021) https://doi.org/10.1117/12.2584807
KEYWORDS: Metrology, Inspection, Ruthenium, Metals, Extreme ultraviolet, Etching, Electron beam lithography, Defect detection

Proceedings Article | 25 June 2019 Open Access Paper
Proceedings Volume 10959, 1095932 (2019) https://doi.org/10.1117/12.2541616
KEYWORDS: Machine learning, Metrology, Inspection, Process control, Optical lithography, Capacitance, Lithography

Proceedings Article | 26 March 2019 Paper
Proceedings Volume 10959, 109590F (2019) https://doi.org/10.1117/12.2515806
KEYWORDS: Machine learning, Semiconducting wafers, Capacitance, Resistance, Critical dimension metrology, Etching, Process control, Diffractive optical elements, Oxides, Scatterometry

Showing 5 of 7 publications
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