Guillaume Thomas
at CEA-LETI
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 27 March 2020 Paper
Proc. SPIE. 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020
KEYWORDS: Lithography, Nanostructures, Silica, Etching, Silicon, Atomic force microscopy, Adsorption, Photomasks, Semiconducting wafers, HF etching

Proceedings Article | 16 August 2019 Presentation
Proc. SPIE. 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
KEYWORDS: Lithography, Optical lithography, Silica, Etching, Silicon, Photomasks, HF etching, Nanolithography, Plasma, New and emerging technologies

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