Mr. Guk-Jin Kim
at Hanyang Univ
SPIE Involvement:
Author
Publications (18)

PROCEEDINGS ARTICLE | October 26, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Graphene, Pellicles, Finite element methods, Extreme ultraviolet, Extreme ultraviolet lithography, Silicon carbide

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Refractive index, Deep ultraviolet, Polarization, Silicon, Inspection, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium

SPIE Journal Paper | October 12, 2017
JM3 Vol. 16 Issue 04
KEYWORDS: Pellicles, Particles, Extreme ultraviolet, Critical dimension metrology, Extreme ultraviolet lithography, Photomasks, Distortion, Chromium, Scanners, High volume manufacturing

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Wafer-level optics, Optical lithography, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, EUV optics

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Monochromatic aberrations, Optical lithography, Scanners, Distortion, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Optical calibration, Tolerancing

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Silicon, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Silicon carbide

Showing 5 of 18 publications
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