Dr. Gunter Antesberger
at Adv Mask Technology Ctr GmbH & Co KG
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Metrology, Silica, Scanners, Manufacturing, Image registration, Photomasks, Algorithm development, Semiconducting wafers, Prototyping, Overlay metrology

PROCEEDINGS ARTICLE | September 25, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Lithography, Reticles, Metrology, Calibration, Image processing, Manufacturing, Image registration, Photomasks, Double patterning technology, Standards development

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Reticles, Metrology, Cadmium, Quartz, Error analysis, Manufacturing, Image registration, Photomasks, Double patterning technology, Critical dimension metrology

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Reticles, Statistical analysis, Interferometers, Calibration, Error analysis, Ceramics, Distortion, Image registration, Photomasks, Statistical methods

PROCEEDINGS ARTICLE | March 15, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Etching, Numerical simulations, Image registration, Thermal effects, Photomasks, Semiconducting wafers, Data analysis

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Metrology, Calibration, Etching, Quartz, Profilometers, Photomasks, Phase measurement, Laser metrology, Laser optics, Phase shifts

Showing 5 of 7 publications
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