Dr. Günther G. Ruhl
Engineer at Infineon Technologies AG
SPIE Involvement:
Publications (13)

Proceedings Article | 6 December 2004 Paper
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569276
KEYWORDS: Reflectivity, Silicon, Oxides, Data modeling, Extreme ultraviolet, Interfaces, Performance modeling, Inspection, Silica, Photomasks

Proceedings Article | 2 June 2004 Paper
Josef Mathuni, Jenspeter Rau, Frank-Michael Kamm, Guenther Ruhl, Ch. Holfeld, Florian Letzkus, C. Koepernik, Joerg Butschke
Proceedings Volume 5504, (2004) https://doi.org/10.1117/12.568010
KEYWORDS: Etching, Photomasks, Extreme ultraviolet, Chromium, Tantalum, Critical dimension metrology, Materials processing, Extreme ultraviolet lithography, Reflectivity, Semiconducting wafers

Proceedings Article | 2 June 2004 Paper
Pavel Nesladek, Guenther Ruhl, Marcel Kristlib
Proceedings Volume 5504, (2004) https://doi.org/10.1117/12.568015
KEYWORDS: Etching, Chromium, Critical dimension metrology, Photomasks, Plasma, Plasma etching, Photoresist materials, Optical lithography, Ceramics, Carbon monoxide

Proceedings Article | 28 August 2003 Paper
Rex Anderson, Guenther Ruhl, Pavel Nesladek, Gerhard Prechtl, Winfried Sabisch, Alfred Kersch, Melisa Buie
Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504199
KEYWORDS: Etching, Chlorine, Critical dimension metrology, Oxygen, Photomasks, Plasma etching, Plasma, Data centers, Chromium, Manufacturing

Proceedings Article | 28 August 2003 Paper
Guenther Ruhl, Josef Mathuni, Dirk Knobloch, Frank-Michael Kamm, Jenspeter Rau, Florian Letzkus, Reinhard Springer
Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504243
KEYWORDS: Etching, Polymers, Plasma etching, Photomasks, Plasma, Extreme ultraviolet, Scanning electron microscopy, Photoresist processing, Chromium, Diffractive optical elements

Showing 5 of 13 publications
  • View contact details

Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top