Dr. Günther G. Ruhl
Engineer at Infineon Technologies AG
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 6 December 2004 Paper
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Oxides, Data modeling, Silica, Interfaces, Silicon, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Performance modeling

Proceedings Article | 2 June 2004 Paper
Proc. SPIE. 5504, 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Etching, Materials processing, Reflectivity, Chromium, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Tantalum, Semiconducting wafers

Proceedings Article | 2 June 2004 Paper
Proc. SPIE. 5504, 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Optical lithography, Etching, Ceramics, Chromium, Photoresist materials, Photomasks, Plasma etching, Critical dimension metrology, Carbon monoxide, Plasma

Proceedings Article | 28 August 2003 Paper
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Diffractive optical elements, Etching, Polymers, Chromium, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Plasma etching, Photoresist processing, Plasma

Proceedings Article | 28 August 2003 Paper
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Etching, Manufacturing, Chromium, Oxygen, Photomasks, Plasma etching, Critical dimension metrology, Data centers, Chlorine, Plasma

Showing 5 of 13 publications
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