Günther K. Seitz
at Carl Zeiss SMT AG
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 18 October 2004 Paper
Proc. SPIE. 5533, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II
KEYWORDS: Interferometers, Aspheric lenses, Wavefronts, Mirrors, Extreme ultraviolet, Error analysis, Extreme ultraviolet lithography, Imaging systems, Diffraction, Calibration

Proceedings Article | 13 January 2004 Paper
Proc. SPIE. 5193, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications
KEYWORDS: Mirrors, Metrology, Extreme ultraviolet lithography, Aspheric lenses, Imaging systems, Wavefronts, Scattering, Off axis mirrors, Reflectivity, Interferometers

Proceedings Article | 8 November 2000 Paper
Proc. SPIE. 4146, Soft X-Ray and EUV Imaging Systems
KEYWORDS: Mirrors, Aspheric lenses, Metrology, Extreme ultraviolet lithography, Interferometers, Imaging systems, Reflectivity, Calibration, Optical spheres, Wavefronts

SPIE Journal Paper | 1 June 1993
OE Vol. 32 Issue 06
KEYWORDS: Point spread functions, Imaging systems, Geometrical optics, Image processing, Wavefronts, Ray tracing, Scattering, Diffraction, Error analysis, Coherence imaging

Conference Committee Involvement (1)
Advances in Metrology for X-Ray and EUV Optics
2 August 2005 | San Diego, California, United States
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