Dr. Guo Xiang Ning
at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (30)

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Lithography, Metrology, Statistical analysis, Data modeling, Image processing, Silicon, Scanning electron microscopy, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Analytics, Lithography, Reticles, Metrology, Etching, Process control, Photomasks, Critical dimension metrology, OLE for process control

PROCEEDINGS ARTICLE | October 5, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Wafer-level optics, Lithography, Optical properties, Computer simulations, Photomasks, Optical proximity correction, Optical alignment, Geometrical optics, Algorithm development, Semiconducting wafers

PROCEEDINGS ARTICLE | October 5, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Genetic algorithms, Ions, Computer simulations, Bridges, Genetics, Optical proximity correction, Semiconducting wafers, Yield improvement, Algorithms

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Lithography, Reticles, Modulation, Metals, Image processing, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Lithography, Reticles, Logic, Data modeling, Silicon, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Tolerancing

Showing 5 of 30 publications
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