Dr. Guoxiang Ning
at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (30)

Proceedings Article | 16 October 2017
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Silicon, Optical proximity correction, Critical dimension metrology, Image processing, Lithography, Data modeling, Metrology, Semiconducting wafers, Statistical analysis, Scanning electron microscopy

Proceedings Article | 16 October 2017
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Process control, OLE for process control, Critical dimension metrology, Reticles, Photomasks, Lithography, Etching, Metrology, Analytics

Proceedings Article | 5 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Optical proximity correction, Optical properties, Algorithm development, Optical alignment, Geometrical optics, Wafer-level optics, Computer simulations, Semiconducting wafers, Photomasks, Lithography

Proceedings Article | 5 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Optical proximity correction, Genetic algorithms, Algorithms, Bridges, Genetics, Ions, Computer simulations, Lithography, Yield improvement, Semiconducting wafers

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Semiconducting wafers, Reticles, Photomasks, Optical proximity correction, Critical dimension metrology, Lithography, Modulation, Image processing, Metals, Scanning electron microscopy

Showing 5 of 30 publications
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